Combination of a powerful Glow Discharge source with Ultra-Fast High Resolution simultaneous optics for fast Elemental Depth Profile Analysis of conductive, non-conductive and hybrid materials.

For thin & thick films – from nanometre to hundreds of microns with nanometer depth resolution.

Typical domains of applications include PV, metallurgy, LED manufacturing, corrosion studies, organic and micro-electronics, materials research & development, deposition processes optimisation, PVD, CVD, plasma coatings, automotive, Li batteries,  etc

No UHV  required.

Measurement of all elements of interest (including H, D, O, Li, Na, C, N etc) with patented High Dynamic Detectors.

Optional monochromator with Image mode and high Dynamic detection for full spectrum record and total flexibility.

Pulsed RF Source for operation in RF and pulsed RF modes with auto-matching

Differential double pumping of the source for patented SEM sample preparation

Plasma Cleaning function built in

Patented UFS for Ultra-Fast Sputtering of polymeric and organic materials

Patented DIP – built in interferometer for direct on line depth measurement

Various anode diameters and accessories for odd shape samples

Windows 10 software – Multiple copies provided for remote installations