Measuring Modes
- Contact AFM in air;
- Contact AFM in liquid (optional);
- Semicontact AFM in air;
- Semicontact AFM in liquid (optional);
- True Non-contact AFM;
- Dynamic Force Microscopy (DFM, FM-AFM);
- Dissipation Force Microscopy;
- Top Mode;
- Phase Imaging;
- Lateral Force Microscopy (LFM);
- Force Modulation;
- Conductive AFM (optional);
- I-Top mode (optional);
- Magnetic Force Microscopy (MFM);
- Kelvin Probe (Surface Potential Microscopy);
- Single-pass Kelvin Probe;
- Capacitance Microscopy (SCM)
- Electric Force Microscopy (EFM);
- Single-pass MFM/EFM (“Plane scan”);
- Force curve measurements;
- Piezo Response Force Microscopy (PFM);
- PFM-Top mode;
- Nanolithography;
- Nanomanipulation;
- STM (optional);
- Photocurrent Mapping (optional);
- Volt-ampere characteristic measurements (optional);
- Shear-force Microscopy with tuning fork (ShFM);
- Normal Force Microscopy with tuning fork.
SmartSPM Scanner and Base
Sample scanning range: 100 µm x 100 µm x 15 µm (±10 %)
Scanning type by sample: XY non-linearity 0.05 %; Z non-linearity 0.05 %
Noise: < 0.1 nm RMS in XY dimension in 200 Hz bandwidth with capacitance sensors on; < 0.02 nm RMS in XY dimension in 100 Hz bandwidth with capacitance sensors off; < 0.04 nm RMS Z capacitance sensor in 1000 Hz bandwidth
Resonance frequency: XY: 7 kHz (unloaded); Z: 15 kHz (unloaded)
X, Y, Z movement: Digital closed loop control for X, Y, Z axes; Motorized Z approach range 18 mm
Sample size: Maximum 40 x 50 mm, 15 mm thickness
Sample positioning: Motorized sample positioning range 5 x 5 mm
Positioning resolution: 1 µm
AFM Head HE001
Laser wavelength: 1300nm;
No registration laser influence on biological sample;
No registration laser influence on photovoltaic measurements.
Registration system noise: <0.03nm.
Fully motorized: 4 stepper motors for cantilever and photodiode automated alignment.
Free access to the probe for additional external manipulators and probes;
Top and side simultaneous optical access: planapochromat objectives 10x, NA=0.28 and 20x, NA=0.42 respectively.
AFM Head HE002*
Laser wavelength: 1300nm;
No registration laser influence on biological sample;
No registration laser influence on photovoltaic measurements;
Registration system noise: <0.1nm;
Fully motorized: 4 stepper motors for cantilever and photodiode automated alignment;
Free access to the probe for additional external manipulators and probes;
Top and side simultaneous optical access: with planapochromat objectives, Side objective up to 100x, NA=0.7 Top objective 10x, NA=0.28 simultaneously;
* With HE002 Contact and Semicontact AFM in liquid are impossible.
Optical microscope
Numerical aperture: up to 0.1;
Magnification: on 19″ monitor with 1/3″ CCD from 85x to 1050x;
Horizontal field of view: from 4.5 to 0.37 mm;
Manual detent zoom: 12.5x (motorized zoom optional);
Stand and coarse/fine focusing unit;
Capability to use planapochromat objectives 10x, NA=0.28 and 20x, NA=0.42 and 100x, NA=0.7 (depends on AFM head);
Liquid cell (optional)
Sample size: 2mm thickness, 25mm diameter;
Sample positioning range: 5x5mm;
Positioning resolution: 1um;
Cell size: 40x40x12mm;
Volume of liquid: 3ml;
Capability of liquid exchange;
Autoclave and ultrasonic cleaning of cell parts.
Liquid cell with temperature control (optional)
Sample size: 2mm thickness, 25mm diameter;
Heating: up to 60°C;
Cooling: below room temperature down to 5°C;
Sample positioning range: 5x5mm;
Positioning resolution: better than 1.5um;
Cell size: 40x40x12mm;
Volume of liquid: 3ml;
Capability of liquid exchange;
Autoclave and ultrasonic cleaning of cell parts.
Conductive AFM unit (optional)
Current range: 100fA ÷ 10uA;
3 current ranges (1nA, 100na and 10uA) switchable from program;
Voltage range: -10 ÷ +7V;
RMS current noise: less than 60fA for 1nA range.
Conductive to Kelvin mode switchable from program.
Combined Shear-force and Normal force tuning fork holder (optional)
Compatible with tuning forks with free resonant frequency 32,768 kHz;
Two types of PCBs for tuning fork fixation for shear-force and normal force operation;
Piezoceramic excitation of tuning fork vibration;
Integrated preamplifier for low noise;
Compatible with 100x side objective for TERS\TEPL measurements;
Compatible with 10x top objective.
Nanoindenter unit (optional)
Maximum load: 5mN.
Load noise floor: less than 100nN.
Displacement noise floor: less than 0.2 nm.
Compatibility with optical systems
No interference with optical imaging due to infrared laser;
Upgradeability to OmegaScope for spectroscopic, photovoltaic, SNOM and TERS & TEPL operation.
Protection enclosure with stand for optical microscope (optional)
Acoustic isolation: 30dB;
Electrostatic shielding;
Inlet and outlet fittings for environmental control connection;
Focusing with micrometer screw ± 6.5mm;
Micrometer reading: 10 um;
Focusing sensitivity: better 1um;
Fast service lift: range up to 98mm;
XY positioning: ± 2mm;
Optional fine focusing for 100x objective:
Fine focusing 0.2mm;
Micrometer reading 0.5 um;
Focusing sensitivity better 0.1um;
Humidity control system (optional)
Relative humidity range: 10-85%;
Relative humidity stability: ±1%;
Software
Automatic alignment of registration system;
Automatic configuration and presetting for standard measuring techniques;
Automatic cantilever resonance frequency adjustment;
Capability to work with force curves;
Macro language Lua for programming user functions, scripts and widgets;
Capability to program controller with DSP macro language in real time without reloading control software;
Capability to process images in coordinate space including making cross-sections, fitting and subtracting of polynomial surface up to 12 degree;
FFT processing with capability to treat images in frequency space including filtration and analysis;
Nanolithography and nanomanipulation;
Processing up to 5000×5000 pixel images.